Document Detail

A ZnO-Nanowire Phototransistor Prepared on Glass Substrates.
MedLine Citation:
PMID:  21226533     Owner:  NLM     Status:  Publisher    
The fabrication of a phototransistor via the bridg-ing of two prefabricated electrodes with a laterally grown ZnO nanowire is reported. It was found that the fabricated device is an n-channel enhancement-mode phototransistor with a dark carrier concentration of 6.34 × 10(17) cm(-3) when the gate voltage is biased at 5 V. With an incident-light wavelength of 360 nm and a zero gate bias, it was found that the noise equivalent power and normalized detectivity (D*) of the fabricated ZnO phototransistor were 6.67 × 10(-17) W and 1.27 × 10(13) cm Hz(0.5) W(-1), respectively. It was also found that the current in the device can be modulated efficiently by tuning the wavelength of the excitation source.
W Y Weng; S J Chang; C L Hsu; T J Hsueh
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Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2011-1-12
Journal Detail:
Title:  ACS applied materials & interfaces     Volume:  -     ISSN:  1944-8244     ISO Abbreviation:  -     Publication Date:  2011 Jan 
Date Detail:
Created Date:  2011-1-13     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101504991     Medline TA:  ACS Appl Mater Interfaces     Country:  -    
Other Details:
Languages:  ENG     Pagination:  -     Citation Subset:  -    
Institute of Microelectronics and Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University , Tainan 701, Taiwan.
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