| A ZnO-Nanowire Phototransistor Prepared on Glass Substrates. | |
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MedLine Citation:
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PMID: 21226533 Owner: NLM Status: Publisher |
Abstract/OtherAbstract:
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The fabrication of a phototransistor via the bridg-ing of two prefabricated electrodes with a laterally grown ZnO nanowire is reported. It was found that the fabricated device is an n-channel enhancement-mode phototransistor with a dark carrier concentration of 6.34 × 10(17) cm(-3) when the gate voltage is biased at 5 V. With an incident-light wavelength of 360 nm and a zero gate bias, it was found that the noise equivalent power and normalized detectivity (D*) of the fabricated ZnO phototransistor were 6.67 × 10(-17) W and 1.27 × 10(13) cm Hz(0.5) W(-1), respectively. It was also found that the current in the device can be modulated efficiently by tuning the wavelength of the excitation source. |
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Authors:
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W Y Weng; S J Chang; C L Hsu; T J Hsueh |
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Publication Detail:
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Type: JOURNAL ARTICLE Date: 2011-1-12 |
Journal Detail:
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Title: ACS applied materials & interfaces Volume: - ISSN: 1944-8244 ISO Abbreviation: - Publication Date: 2011 Jan |
Date Detail:
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Created Date: 2011-1-13 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101504991 Medline TA: ACS Appl Mater Interfaces Country: - |
Other Details:
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Languages: ENG Pagination: - Citation Subset: - |
Affiliation:
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Institute of Microelectronics and Department of Electrical Engineering, Center for Micro/Nano Science and Technology, Advanced Optoelectronic Technology Center, National Cheng Kung University , Tainan 701, Taiwan. |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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