Document Detail


Vapor phase polymerization of PEDOT from micron and nanometer scale oxidant patterned by dip-pen nanolithography.
MedLine Citation:
PMID:  22651696     Owner:  NLM     Status:  Publisher    
Abstract/OtherAbstract:
Some of the most exciting recent advances in conducting polymer synthesis have centred around the method of vapor phase polymerization (VPP) of thin films. However, it is not known whether the VPP process can proceed using significantly reduced volumes of oxidant and therefore be implemented as part of nanolithography approach. Here, we present a strategy for sub-micron scale patterning of the conducting polymer poly(3,4-ethylenedioxythiophene) (PEDOT) via in-situ VPP. Attolitre (10 18 L) volumes of oxidant 'ink' are controllably deposited using dip-pen nanolithography (DPN). DPN patterning of the oxidant ink is facilitated by the incorporation of an amphiphilic block copolymer thickener, an additive that also assists with stabilization of the oxidant. When exposed to EDOT monomer in a VPP chamber, each deposited feature localizes the synthesis of conducting PEDOT structures of several micrometers down to 250 nm in width. PEDOT patterns are characterised by atomic force microscopy (AFM), conductive AFM, two probe electrical measurement and micro-Raman spectroscopy evidencing in-situ vapor phase synthesis of conducting polymer at a scale (picogram) which is much smaller than that previously reported. Although the process of VPP on this scale was achieved, we highlight some of the challenges that need to be overcome to make this feasible approach in an applied setting.
Authors:
Cathal D O'Connell; Michael J Higgins; Hiroshi Nakashima; Simon E Moulton; Gordon G Wallace
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Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2012-5-31
Journal Detail:
Title:  Langmuir : the ACS journal of surfaces and colloids     Volume:  -     ISSN:  1520-5827     ISO Abbreviation:  -     Publication Date:  2012 May 
Date Detail:
Created Date:  2012-6-1     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  9882736     Medline TA:  Langmuir     Country:  -    
Other Details:
Languages:  ENG     Pagination:  -     Citation Subset:  -    
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