Document Detail

TiO2 embedded Si nanowire network based Schottky detector for enlarged light detection.
MedLine Citation:
PMID:  24758037     Owner:  NLM     Status:  In-Process    
The Si nanowire (NW) network was fabricated on the Si substrate with the help of glancing angle synthesized Ag NPs assisted etching technique. The horizontal Si NWs network was characterized by field emission gun-scanning electron microscopy which shows the formation of long Si NWs of diameter within the range of 110-180 nm. The TiO2 thin film (TF) was deposited on the Si NWs, which shows -2.5 times enlarged optical absorption than that of bare Si substrate. Ag-TiO2 contacts exhibit Schottky behaviour and higher photoconduction was observed for TiO2-Si NW detector than that of TiO2 TF under illumination. The dark currents of TiO2 TF and TiO2-Si NW devices were exerted to be 0.1 mA/cm2 and 0.2 mA/cm2 at +1 V, which increased to 0.2 mA/cm2 and 1.23 mA/cm2, respectively, under the illumination of 100 W filament bulb. A threefold enhanced photodetection for the Si NW device was observed compared to the TiO2 TF device. The nonlinear rise of photocurrent of 2 x 10(-2) mA/cm2, after 5 min light illumination was observed due to carrier diffusion effect.
A Mondal; K Bhowmik; J C Dhar; N K Singh; T Goswami
Related Documents :
23798377 - Mapping of trap densities and hotspots in pentacene thin-film transistors by frequency-...
24017237 - Radial distribution function analyses of amorphous carbon films containing silicon and ...
24584417 - In situ tem ion irradiation and implantation effects on au nanoparticle morphologies.
22887037 - Monte carlo simulation of cd-sem images for linewidth and critical dimension metrology.
15904397 - Optical performance of carbon-nanotube electron sources.
22107277 - Energy landscape of 3d spin hamiltonians with topological order.
Publication Detail:
Type:  Journal Article; Research Support, Non-U.S. Gov't    
Journal Detail:
Title:  Journal of nanoscience and nanotechnology     Volume:  14     ISSN:  1533-4880     ISO Abbreviation:  J Nanosci Nanotechnol     Publication Date:  2014 Jul 
Date Detail:
Created Date:  2014-04-24     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101088195     Medline TA:  J Nanosci Nanotechnol     Country:  United States    
Other Details:
Languages:  eng     Pagination:  5390-4     Citation Subset:  IM    
Export Citation:
APA/MLA Format     Download EndNote     Download BibTex
MeSH Terms

From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine

Previous Document:  IrO2 nanodot formation by plasma enhanced atomic layer deposition as a charge storage layer.
Next Document:  Flow cytometric assessment of reactive oxygen species generations that are directly related to cellu...