Document Detail


Thermo-optic effect and optical third order nonlinearity in nc-Si embedded in a silicon-nitride film.
MedLine Citation:
PMID:  18958117     Owner:  NLM     Status:  PubMed-not-MEDLINE    
Abstract/OtherAbstract:
Using a self-diffraction experiment with 7ns pulses at 532nm we studied a silicon nitride film containing silicon nanoclusters (nc-Si) of 3.1+/-0.37 nm mean size. The sample was prepared by remote plasma-enhanced chemical vapor deposition (RPECVD), and we found that its nonlinearity consists of a combination of electronic and thermal contributions. By varying the repetition rate of the laser, we discriminated the responsible mechanisms for the nonlinear response. Using this procedure we determined a total /chi((3))1111/ = 3.3x10(-10)esu, n2 = 2.7x10(-16) m(2)/W, beta = 1x10(-9) m/W and dn/dT =1x10(-4) degrees C(-1) for our sample. We also show results for the optical Kerr effect using 80 fs pulses at 820 nm. The purely electronic nonlinearity measured is characterized by /chi((3))1111/=9.5 x10(-11) esu.
Authors:
C Torres-Torres; A López-Suárez; L Tamayo-Rivera; R Rangel-Rojo; A Crespo-Sosa; J C Alonso; A Oliver
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Publication Detail:
Type:  Journal Article; Research Support, Non-U.S. Gov't    
Journal Detail:
Title:  Optics express     Volume:  16     ISSN:  1094-4087     ISO Abbreviation:  Opt Express     Publication Date:  2008 Oct 
Date Detail:
Created Date:  2008-10-29     Completed Date:  2008-12-08     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101137103     Medline TA:  Opt Express     Country:  United States    
Other Details:
Languages:  eng     Pagination:  18390-6     Citation Subset:  -    
Affiliation:
Sección de Estudios de Posgrado e Investigación-ESIME-IPN, Zacatenco, México DF, México. crstorres@yahoo.com.mx
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