| Surface structure of metal-organic framework grown on self-assembled monolayers revealed by high-resolution atomic force microscopy. | |
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MedLine Citation:
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PMID: 18850705 Owner: NLM Status: MEDLINE |
Abstract/OtherAbstract:
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The surface structure of an individual metal-organic framework (MOF) microcrystal grown on a functionalized surface has been successfully investigated for the first time in air and vacuum using high-resolution atomic force microscopy. Moreover, this detailed surface analysis has been utilized to optimize the MOF formation procedure to obtain a defect-free surface structure. Comparison of obtained data with recent microscopic studies performed on the same MOF crystal but grown by a conventional procedure clearly shows a much higher quality of crystals produced by surface oriented growth. Importantly, this method of preparing crystals suitable for microscopic analysis is also much faster (3 days compared to 2 years) and, in contrast to the conventional method, produces material suitable for in situ study. These results thus demonstrate for the first time the possibility of nanoscale investigation/modification of MOF surface structure. |
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Authors:
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Katarzyna Szelagowska-Kunstman; Piotr Cyganik; Maria Goryl; Denise Zacher; Zita Puterova; Roland A Fischer; Marek Szymonski |
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Publication Detail:
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Type: Journal Article; Research Support, Non-U.S. Gov't Date: 2008-10-14 |
Journal Detail:
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Title: Journal of the American Chemical Society Volume: 130 ISSN: 1520-5126 ISO Abbreviation: J. Am. Chem. Soc. Publication Date: 2008 Nov |
Date Detail:
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Created Date: 2008-10-30 Completed Date: 2008-12-24 Revised Date: 2009-01-27 |
Medline Journal Info:
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Nlm Unique ID: 7503056 Medline TA: J Am Chem Soc Country: United States |
Other Details:
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Languages: eng Pagination: 14446-7 Citation Subset: IM |
Affiliation:
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Research Center for Nanometer-Scale Science and Advanced Materials, Faculty of Physics, Astronomy, and Applied Computer Science, Jagiellonian University, 30-059 Kraków, Poland. |
Export Citation:
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| MeSH Terms | |
Descriptor/Qualifier:
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Copper
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chemistry* Crystallization Microscopy, Atomic Force Microscopy, Electron, Transmission Nanoparticles / chemistry Organometallic Compounds / chemistry* Silicon / chemistry* Silicon Dioxide / chemistry* Surface Properties Tricarboxylic Acids / chemistry* |
| Chemical | |
Reg. No./Substance:
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0/Organometallic Compounds; 0/Tricarboxylic Acids; 554-95-0/trimesic acid; 7440-21-3/Silicon; 7440-50-8/Copper; 7631-86-9/Silicon Dioxide |
From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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