Document Detail


Sub 50 nm nano-patterns with carbon based spin-on organic hardmask.
MedLine Citation:
PMID:  22849125     Owner:  NLM     Status:  In-Process    
Abstract/OtherAbstract:
Carbon based spin-on organic hardmask (C-SOH) was used as an imprint resin to fabricate sub 50 nm sized patterns. Imprinting of C-SOH was done with a polyurethaneacrylate (PUA) stamp. Patternability and etch resistance of the C-SOH resin was compared to poly(methyl methacrylate) (PMMA). C-SOH can be patterned at the nanosize using imprint lithography and exhibits superior etch resistance, especially for F-based plasmas. Due to the poor etch resistance of imprint resin such as PMMA, it is seldom used as an etch mask to form nano-structures by etching the Si3N4 layer. However, such a nano-structure was able to be formed by etching the Si3N4 layer using C-SOH as an etch mask.
Authors:
Ju-Hyeon Shin; Ki-Yeon Yang; Kang-Soo Han; Hyeong-Seok Kim; Heon Lee
Related Documents :
18284475 - Species diversity and persistence in restored and remnant tallgrass prairies of north a...
8614695 - Quantitative determination of spermatozoa penetration of the perivitelline layer of the...
7971665 - Effects of cage versus floor rearing environments and cage floor mesh size on bone stre...
22567455 - Dental aspect of distal tubular renal acidosis with genu valgum secondary to rickets: a...
22771415 - Longevity of repaired restorations: a practice based study.
3228615 - Long-term precision of dual photon absorptiometry in the lumbar spine in clinical setti...
Publication Detail:
Type:  Journal Article; Research Support, Non-U.S. Gov't    
Journal Detail:
Title:  Journal of nanoscience and nanotechnology     Volume:  12     ISSN:  1533-4880     ISO Abbreviation:  J Nanosci Nanotechnol     Publication Date:  2012 Apr 
Date Detail:
Created Date:  2012-08-01     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101088195     Medline TA:  J Nanosci Nanotechnol     Country:  United States    
Other Details:
Languages:  eng     Pagination:  3364-8     Citation Subset:  IM    
Affiliation:
Department of Materials Science and Engineering, Korea University, Anam-Dong 5-Ga, Seongbuk-Gu, Seoul 136-713, Korea.
Export Citation:
APA/MLA Format     Download EndNote     Download BibTex
MeSH Terms
Descriptor/Qualifier:

From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine


Previous Document:  Pixel-isolation walls of liquid crystal display based on prepolymer containing vinyl cinnamate.
Next Document:  Strong ligand field effects of blue phosphorescent Ir(III) complexes with phenylpyrazole and phosphi...