Document Detail

Stamping-based planarization of flexible substrate for low-pressure UV nanoimprint lithography.
MedLine Citation:
PMID:  19198287     Owner:  NLM     Status:  MEDLINE    
Patterning flexible substrates in nano scale is an important and challenging issue in the fabrication of next-generation devices based on a non-silicon substrate. Step and Flash imprint lithography (S-FIL) which is a room temperature and low pressure process offers several important advantages, such as the use of a smaller and therefore cheaper stamp or the possibility of the overlay imprinting, as a transparent stamp is utilized. However, it is very difficult to perform S-FIL on a flexible substrate successfully due to the high waviness. The waviness of a flexible substrate is not a constant value in contrast to a rigid substrate. It depends on the imprint pressure applied onto the substrate. In this paper, in section two, the effect of the imprint pressure on the waviness of the surface of the flexible substrate is examined. It is proved that the waviness of the surface of the flexible substrate could not be reduced sufficiently to assure a successful imprint at low imprint pressures. In the third section, a method of patterning polymer substrates using ultra-violet nanoimprint lithography (UV-NIL) is presented. The method consists of two stages, stamping-based planarization and S-FIL. In stamping-based planarization, a planarization layer of transparent polymer is formed onto the flexible substrate. Waviness of the blank stamp (in this study, glass wafer) is transferred to the planarization layer. S-FIL is performed with the nanoimprint tool IMPRIO100 directly onto the planarization layer employing a 1 x 1 in. quartz stamp. Optical microscope and SEM images of the successfully imprinted patterns were also presented.
Ali Ozhan Altun; Jun-Ho Jeong; Sung-Un Jung; Ki-Don Kim; Dae-Geun Choi; Jun-Hyuk Choi; Jong-Youp Shim; Dong-Il Lee; Eung-Sug Lee
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Publication Detail:
Type:  Journal Article; Research Support, Non-U.S. Gov't    
Journal Detail:
Title:  Journal of nanoscience and nanotechnology     Volume:  8     ISSN:  1533-4880     ISO Abbreviation:  J Nanosci Nanotechnol     Publication Date:  2008 Nov 
Date Detail:
Created Date:  2009-02-09     Completed Date:  2009-03-17     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101088195     Medline TA:  J Nanosci Nanotechnol     Country:  United States    
Other Details:
Languages:  eng     Pagination:  5673-7     Citation Subset:  IM    
Nano-Mechanical Systems Research Center, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea.
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MeSH Terms
Crystallization / methods*
Elastic Modulus / radiation effects
Macromolecular Substances / chemistry,  radiation effects
Materials Testing
Molecular Conformation / radiation effects
Nanostructures / chemistry*,  radiation effects,  ultrastructure*
Nanotechnology / methods*
Particle Size
Polymers / chemistry*,  radiation effects
Surface Properties / radiation effects
Ultraviolet Rays
Reg. No./Substance:
0/Macromolecular Substances; 0/Polymers

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