| Spectrometric analysis of process etching solutions of the photovoltaic industry-Determination of HNO(3), HF, and H(2)SiF(6) using high-resolution continuum source absorption spectrometry of diatomic molecules and atoms. | |
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MedLine Citation:
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PMID: 22608457 Owner: NLM Status: In-Data-Review |
Abstract/OtherAbstract:
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The surface of raw multicrystalline silicon wafers is treated with HF-HNO(3) mixtures in order to remove the saw damage and to obtain a well-like structured surface of low reflectivity, the so-called texture. The industrial production of solar cells requires a consistent level of texturization for tens of thousands of wafers. Therefore, knowing the actual composition of the etch bath is a key element in process control in order to maintain a certain etch rate through replenishment of the consumed acids. The present paper describes a novel approach to quantify nitric acid (HNO(3)), hydrofluoric acid (HF), and hexafluosilicic acid (H(2)SiF(6)) using a high-resolution continuum source graphite furnace absorption spectrometer. The concentrations of Si (via Si atom absorption at the wavelength 251.611nm, m(0),(Si)=130pg), of nitrate (via molecular absorption of NO at the wavelength 214.803nm, [Formula: see text] ), and of total fluoride (via molecular absorption of AlF at the wavelength 227.46nm, m(0,F)=13pg) were measured against aqueous standard solutions. The concentrations of H(2)SiF(6) and HNO(3) are directly obtained from the measurements. The HF concentration is calculated from the difference between the total fluoride content, and the amount of fluoride bound as H(2)SiF(6). H(2)SiF(6) and HNO(3) can be determined with a relative uncertainty of less than 5% and recoveries of 97-103% and 96-105%, respectively. With regards to HF, acceptable results in terms of recovery and uncertainty are obtained for HF concentrations that are typical for the photovoltaic industry. The presented procedure has the unique advantage that the concentration of both, acids and metal impurities in etch solutions, can be routinely determined by a single analytical instrument. |
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Authors:
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Stefan Bücker; Jörg Acker |
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Publication Detail:
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Type: Journal Article Date: 2012-04-02 |
Journal Detail:
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Title: Talanta Volume: 94 ISSN: 1873-3573 ISO Abbreviation: Talanta Publication Date: 2012 May |
Date Detail:
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Created Date: 2012-05-21 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 2984816R Medline TA: Talanta Country: Netherlands |
Other Details:
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Languages: eng Pagination: 335-41 Citation Subset: IM |
Copyright Information:
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Copyright © 2012 Elsevier B.V. All rights reserved. |
Affiliation:
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Hochschule Lausitz (FH) - University of Applied Sciences, Faculty of Natural Sciences, Department of Chemistry, Großenhainer Straße 57, D-01968 Senftenberg, Germany. |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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