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Second harmonic generation from metallo-dielectric multilayered structures in the plasmonic regime.
MedLine Citation:
PMID:  21164714     Owner:  NLM     Status:  In-Process    
We present a theoretical study on second harmonic generation from metallo-dielectric multilayered structures in the plasmonic regime. In particular we analyze the behavior of structures made of Ag (silver) and MgF2 (magnesium-fluoride) due to the straightforward procedure to grow these materials with standard sputtering or thermal evaporation techniques. A systematic study is performed which analyzes four different kinds of elementary cells--namely (Ag/MgF2)N, (MgF2/Ag)N, (Ag/MgF2/Ag)N and (MgF2/Ag/MgF2)N--as function of the number of periods (N) and the thickness of the layers. We predict the conversion efficiency to be up to three orders of magnitude greater than the conversion efficiency found in the non-plasmonic regime and we point out the best geometries to achieve these conversion efficiencies. We also underline the role played by the short-range/long-range plasmons and leaky waves in the generation process. We perform a statistical study to demonstrate the robustness of the SH process in the plasmonic regime against the inevitable variations in the thickness of the layers. Finally, we show that a proper choice of the output medium can further improve the conversion efficiency reaching an enhancement of almost five orders of magnitude with respect to the non plasmonic regime.
Nadia Mattiucci; Giuseppe D'Aguanno; Mark J Bloemer
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Publication Detail:
Type:  Journal Article; Research Support, U.S. Gov't, Non-P.H.S.    
Journal Detail:
Title:  Optics express     Volume:  18     ISSN:  1094-4087     ISO Abbreviation:  Opt Express     Publication Date:  2010 Nov 
Date Detail:
Created Date:  2010-12-17     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101137103     Medline TA:  Opt Express     Country:  United States    
Other Details:
Languages:  eng     Pagination:  23698-710     Citation Subset:  IM    
C. M. Bowden Facility, Bldg 7804, RDECOM, Redstone Arsenal, AL 35898, USA.
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