Document Detail

Potential of electric discharge plasma methods in abatement of volatile organic compounds originating from the food industry.
MedLine Citation:
PMID:  23238056     Owner:  NLM     Status:  Publisher    
Increased volatile organic compounds emissions and commensurate tightening of applicable legislation mean that the development and application of effective, cost-efficient abatement methods are areas of growing concern. This paper reviews the last two decades' publications on organic vapour emissions from food processing, their sources, impacts and treatment methods. An overview of the latest developments in conventional air treatment methods is presented, followed by the main focus of the paper, non-thermal plasma technology. The results of the review suggest that non-thermal plasma technology, in its pulsed corona discharge configuration, is an emerging treatment method with potential for low-cost, effective abatement of a wide spectrum of organic air pollutants. It is found that the combination of plasma treatment with catalysis is a development trend that demonstrates considerable potential. The as yet relatively small number of plasma treatment applications is considered to be due to the novelty of pulsed electric discharge techniques and a lack of reliable pulse generators and reactors. Other issues acting as barriers to widespread adoption of the technique include the possible formation of stable oxidation by-products, residual ozone and nitrogen oxides, and sensitivity towards air humidity.
S Preis; D Klauson; A Gregor
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Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2012-12-10
Journal Detail:
Title:  Journal of environmental management     Volume:  114C     ISSN:  1095-8630     ISO Abbreviation:  J. Environ. Manage.     Publication Date:  2012 Dec 
Date Detail:
Created Date:  2012-12-14     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  0401664     Medline TA:  J Environ Manage     Country:  -    
Other Details:
Languages:  ENG     Pagination:  125-138     Citation Subset:  -    
Copyright Information:
Copyright © 2012 Elsevier Ltd. All rights reserved.
LUT Chemistry, Lappeenranta University of Technology, P.O. Box 20, 53851 Lappeenranta, Finland.
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