Document Detail


Polymer-Confined Colloidal Monolayer: A Reusable Soft Photomask for Rapid Wafer-Scale Nanopatterning.
MedLine Citation:
PMID:  25375239     Owner:  NLM     Status:  Publisher    
Abstract/OtherAbstract:
We demonstrate the repeated utilization of self-assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Due to the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problem, enabling reliable productions of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.
Authors:
Ming Fang; Hao Lin; HoYuen Cheung; Fei Xiu; Lifan Shen; SenPo Yip; Edwin Yue-Bun Pun; Chun-Yuen Wong; Johnny C Ho
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Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2014-11-6
Journal Detail:
Title:  ACS applied materials & interfaces     Volume:  -     ISSN:  1944-8252     ISO Abbreviation:  ACS Appl Mater Interfaces     Publication Date:  2014 Nov 
Date Detail:
Created Date:  2014-11-6     Completed Date:  -     Revised Date:  2014-11-7    
Medline Journal Info:
Nlm Unique ID:  101504991     Medline TA:  ACS Appl Mater Interfaces     Country:  -    
Other Details:
Languages:  ENG     Pagination:  -     Citation Subset:  -    
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