Document Detail


Photoablation and lens damage from fractional Talbot images of Dammann gratings.
MedLine Citation:
PMID:  18253378     Owner:  NLM     Status:  In-Data-Review    
Abstract/OtherAbstract:
UV photoablation of materials is recorded for both the near and far fields after transmission through a Dammann grating. The fused silica Fourier lens used for far-field imaging was damaged by a near-field intensity pattern with the same periodicity as the Dammann grating. The lens was located inadvertently at one eighth of the Talbot distance Z (T) behind the Dammann grating. Patterns recorded in copper film at the even-fractional Talbot planes compare qualitatively with calculated intensities. On the basis of these findings, a near-field intensity pattern was used to ablate vias in copper and polyimide films. The pattern at a distance of Z(T)/8 was used for via ablation because it is the pattern with the most fluence per spot.
Authors:
K Tatah; A Fukumoto; T J Suleski; D C O'Shea
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Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Applied optics     Volume:  36     ISSN:  0003-6935     ISO Abbreviation:  Appl Opt     Publication Date:  1997 May 
Date Detail:
Created Date:  2008-02-06     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  0247660     Medline TA:  Appl Opt     Country:  United States    
Other Details:
Languages:  eng     Pagination:  3577-80     Citation Subset:  -    
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