| Periodic si nanopillar arrays fabricated by colloidal lithography and catalytic etching for broadband and omnidirectional elimination of Fresnel reflection. | |
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MedLine Citation:
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PMID: 20666420 Owner: NLM Status: MEDLINE |
Abstract/OtherAbstract:
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Periodic Si nanopillar arrays (NPAs) were fabricated by the colloidal lithography combined with catalytic etching. By varying the size of colloidal crystals using oxygen plasma etching, Si NPAs with desirable diameter and fill factor could be obtained. The Fresnel reflection can be eliminated effectively over broadband regions by NPAs; i.e., the wavelength-averaged specular reflectance is decreased to 0.70% at wavelengths of 200-1900 nm. The reflectance is reduced greatly for the incident angles up to 70 degrees for both s- and p-polarized light. These excellent antireflection performances are attributed to light trapping effect and very low effective refractive indices, which can be modified by the fill factor of Si in the NPA layers. |
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Authors:
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Hsin-Ping Wang; Kun-Yu Lai; Yi-Ruei Lin; Chin-An Lin; Jr-Hau He |
Publication Detail:
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Type: Journal Article; Research Support, Non-U.S. Gov't |
Journal Detail:
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Title: Langmuir : the ACS journal of surfaces and colloids Volume: 26 ISSN: 1520-5827 ISO Abbreviation: Langmuir Publication Date: 2010 Aug |
Date Detail:
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Created Date: 2010-07-29 Completed Date: 2010-11-04 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 9882736 Medline TA: Langmuir Country: United States |
Other Details:
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Languages: eng Pagination: 12855-8 Citation Subset: IM |
Affiliation:
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Institute of Photonics and Optoelectronics, National Taiwan University, Taipei, 106 Taiwan, ROC. |
Export Citation:
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APA/MLA Format Download EndNote Download BibTex |
| MeSH Terms | |
Descriptor/Qualifier:
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Nanostructures
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chemistry* Nanotechnology / methods* Nanowires / chemistry* Silicon / chemistry* |
| Chemical | |
Reg. No./Substance:
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7440-21-3/Silicon |
From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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