Document Detail

Oxidation of nonylphenol ethoxylates in aqueous solution by UV-C photolysis, H2O2/UV-C, Fenton and photo-Fenton processes: are these processes toxicologically safe?
MedLine Citation:
PMID:  24185063     Owner:  NLM     Status:  In-Data-Review    
UV-C, H2O2/UV-C, Fenton and photo-Fenton treatment of a nonylphenol polyethoxylate (NP-10) were comparatively studied, primarily focusing on the acute toxicity of degradation products. Formic, acetic and oxalic acids were all identified as the degradation products of NP-10; however, the sole common carboxylic acid was found to be formic acid for the studied treatment processes. The percent relative inhibition towards Vibrio fischeri increased from 9% to 33% and 24% after 120 min-UV-C and H2O2/UV-C treatment, respectively. Complete NP-10 and 70% of its total organic carbon (TOC) content was removed by the photo-Fenton process, which ensured the fastest removal rates and lowest inhibitory effect (8% after 120 min treatment). The acute toxicity pattern being observed during H2O2/UV-C and photo-Fenton treatment positively correlated with temporal evolution of the identified carboxylic acids, whereas unidentified oxidation products were the most likely origin of the acute toxicity in UV-C photolysis.
Akin Karci; Idil Arslan-Alaton; Miray Bekbolet
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Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Water science and technology : a journal of the International Association on Water Pollution Research     Volume:  68     ISSN:  0273-1223     ISO Abbreviation:  Water Sci. Technol.     Publication Date:  2013  
Date Detail:
Created Date:  2013-11-04     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  9879497     Medline TA:  Water Sci Technol     Country:  England    
Other Details:
Languages:  eng     Pagination:  1801-9     Citation Subset:  IM    
Institute of Environmental Sciences, Bogazici University, 34342 Bebek, Istanbul, Turkey E-mail:
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