| Optimum condition of anisotropic plasma etching for improving bending properties of ionic polymer-metal composites. | |
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MedLine Citation:
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PMID: 20358943 Owner: NLM Status: PubMed-not-MEDLINE |
Abstract/OtherAbstract:
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We presented an anisotropic plasma etching technique by reactive ion etcher (RIE) as a new pretreatment method of fabrication of ionic polymer-metal composite (IPMC). We already found that the new technique provided large displacement to the fabricated IPMC in the presence of low applied voltage. However, we did not examine the optimum condition for the anisotropic plasma etching. In this research, we tried to figure out optimum treatment condition of film in etcher. Nafion (by DuPont) films were etched using various etching time and shadow masks with various slit and space sizes. The etched samples were plated with Pt at top and bottom side by Oguro's reduction method. The surface morphology of fabricated IPMCs was characterized by SEM. And, we've measured surface resistance, bending displacement, and driving force in order to check the IPMC properties out. Here, we found that optimum condition for pre-treatment of Nafion was 1 min for etching time under shadow mask with 200 microm slit and 100 microm space. |
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Authors:
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N J Choi; H K Lee; S Jung; K H Park |
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Publication Detail:
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Type: Journal Article; Research Support, Non-U.S. Gov't |
Journal Detail:
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Title: Journal of nanoscience and nanotechnology Volume: 10 ISSN: 1533-4880 ISO Abbreviation: J Nanosci Nanotechnol Publication Date: 2010 May |
Date Detail:
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Created Date: 2010-04-02 Completed Date: 2010-05-19 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101088195 Medline TA: J Nanosci Nanotechnol Country: United States |
Other Details:
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Languages: eng Pagination: 3299-303 Citation Subset: - |
Affiliation:
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Nano Convergence Sensor Team, NT Convergence Components Research Department, Electronics and Telecommunications Research Institute, Daejeon 305-700, Korea. |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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