| Optical and mechanical characterization of evaporated SiO(2) layers. Long-term evolution. | |
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MedLine Citation:
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PMID: 21102937 Owner: NLM Status: In-Data-Review |
Abstract/OtherAbstract:
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Numerous characterizations were performed on 120-nm thick evaporated SiO(2) layers in order to understand how their features change as a function of deposition conditions and time. Density decreases with increasing deposition pressure. It governs all the layer properties (refractive index, hardness, and stress). In situ stress measurements show that stress can be divided into intrinsic and water-induced components, respectively linked to local density (outside the pores) and porosity. Intrinsic stress increase with decreasing pressure is explained by a diminution of the Si-O-Si bond angle (IR measurements). Long-term evolution is characterized by stress relaxation related to Si-O-Si strained bond hydrolysis. |
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Authors:
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K Scherer; L Nouvelot; P Lacan; R Bosmans |
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Publication Detail:
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Type: Journal Article |
Journal Detail:
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Title: Applied optics Volume: 35 ISSN: 0003-6935 ISO Abbreviation: Appl Opt Publication Date: 1996 Sep |
Date Detail:
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Created Date: 2010-11-24 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 0247660 Medline TA: Appl Opt Country: United States |
Other Details:
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Languages: eng Pagination: 5067-72 Citation Subset: - |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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