| Nanostructures and functional materials fabricated by interferometric lithography. | |
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MedLine Citation:
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PMID: 20976672 Owner: NLM Status: In-Process |
Abstract/OtherAbstract:
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Interferometric lithography (IL) is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium, such as a photoresist, that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with IL are a platform for further fabrication of nanostructures and growth of functional materials and are building blocks for devices. This article provides a brief review of IL technologies and focuses on various applications for nanostructures and functional materials based on IL including directed self-assembly of colloidal nanoparticles, nanophotonics, semiconductor materials growth, and nanofluidic devices. Perspectives on future directions for IL and emerging applications in other fields are presented. |
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Authors:
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Deying Xia; Zahyun Ku; S C Lee; S R J Brueck |
Publication Detail:
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Type: Journal Article; Research Support, U.S. Gov't, Non-P.H.S. |
Journal Detail:
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Title: Advanced materials (Deerfield Beach, Fla.) Volume: 23 ISSN: 1521-4095 ISO Abbreviation: Adv. Mater. Weinheim Publication Date: 2011 Jan |
Date Detail:
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Created Date: 2010-12-30 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 9885358 Medline TA: Adv Mater Country: Germany |
Other Details:
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Languages: eng Pagination: 147-79 Citation Subset: IM |
Affiliation:
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Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA. |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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