Document Detail


Nanoimprint Lithography for High-Efficiency Thin-Film Silicon Solar Cells.
MedLine Citation:
PMID:  21302973     Owner:  NLM     Status:  Publisher    
Abstract/OtherAbstract:
We demonstrate high-efficiency thin-film silicon solar cells with transparent nanotextured front electrodes fabricated via ultraviolet nanoimprint lithography on glass substrates. By replicating the morphology of state-of-the-art nanotextured zinc oxide front electrodes known for their exceptional light trapping properties, conversion efficiencies of up to 12.0% are achieved for micromorph tandem junction cells. Excellent light incoupling results in a remarkable summed short-circuit current density of 25.9 mA/cm(2) for amorphous top cell and microcrystalline bottom cell thicknesses of only 250 and 1100 nm, respectively. As efforts to maximize light harvesting continue, our study validates nanoimprinting as a versatile tool to investigate nanophotonic effects of a large variety of nanostructures directly on device performance.
Authors:
Corsin Battaglia; Jordi Escarré; Karin Söderström; Lukas Erni; Laura Ding; Grégory Bugnon; Adrian Billet; Mathieu Boccard; Loris Barraud; Stefaan De Wolf; Franz-Josef Haug; Matthieu Despeisse; Christophe Ballif
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Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2010-12-28
Journal Detail:
Title:  Nano letters     Volume:  11     ISSN:  1530-6992     ISO Abbreviation:  -     Publication Date:  2011 Feb 
Date Detail:
Created Date:  2011-2-9     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101088070     Medline TA:  Nano Lett     Country:  -    
Other Details:
Languages:  ENG     Pagination:  661-665     Citation Subset:  -    
Affiliation:
Ecole Polytechnique Fédérale de Lausanne (EPFL), Institute of Microengineering (IMT), Photovoltaics and Thin Film Electronics Laboratory, 2000 Neuchâtel, Switzerland.
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