| Nanogrids and Beehive-Like Nanostructures Formed by Plasma Etching the Self-Organized SiGe Islands. | |
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MedLine Citation:
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PMID: 20730116 Owner: NLM Status: Publisher |
Abstract/OtherAbstract:
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A lithography-free method for fabricating the nanogrids and quasi-beehive nanostructures on Si substrates is developed. It combines sequential treatments of thermal annealing with reactive ion etching (RIE) on SiGe thin films grown on (100)-Si substrates. The SiGe thin films deposited by ultrahigh vacuum chemical vapor deposition form self-assembled nanoislands via the strain-induced surface roughening (Asaro-Tiller-Grinfeld instability) during thermal annealing, which, in turn, serve as patterned sacrifice regions for subsequent RIE process carried out for fabricating nanogrids and beehive-like nanostructures on Si substrates. The scanning electron microscopy and atomic force microscopy observations confirmed that the resultant pattern of the obtained structures can be manipulated by tuning the treatment conditions, suggesting an interesting alternative route of producing self-organized nanostructures. |
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Authors:
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Yuan-Ming Chang; Sheng-Rui Jian; Jenh-Yih Juang |
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Publication Detail:
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Type: JOURNAL ARTICLE Date: 2010-6-8 |
Journal Detail:
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Title: Nanoscale research letters Volume: 5 ISSN: 1556-276X ISO Abbreviation: - Publication Date: 2010 |
Date Detail:
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Created Date: 2010-8-23 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101279750 Medline TA: Nanoscale Res Lett Country: - |
Other Details:
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Languages: ENG Pagination: 1456-1463 Citation Subset: - |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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