| Monolithic double-grating phase mask for large-period highly coherent grating printing. | |
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MedLine Citation:
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PMID: 20016618 Owner: NLM Status: PubMed-not-MEDLINE |
Abstract/OtherAbstract:
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A monolithic double-grating phase mask comprising three short-pitch grating sections of spatial frequencies k(1) and k(2) collocated at one side of a substrate produces a large-period interferogram without higher harmonics to print in a photoresist film a latent grating of small spatial frequency equal to twice k(2)-k(1). When incorporated in a write-on-the-fly scheme, the elements permit the fabrication of unlimitedly long gratings. |
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Authors:
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Y Bourgin; S Bakkali; Y Jourlin; S Tonchev; O Parriaux |
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Publication Detail:
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Type: Journal Article |
Journal Detail:
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Title: Optics letters Volume: 34 ISSN: 1539-4794 ISO Abbreviation: Opt Lett Publication Date: 2009 Dec |
Date Detail:
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Created Date: 2009-12-17 Completed Date: 2010-03-02 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 7708433 Medline TA: Opt Lett Country: United States |
Other Details:
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Languages: eng Pagination: 3800-2 Citation Subset: - |
Affiliation:
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Universit? de Lyon, F-42023 Saint-Etienne, France. |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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