| Mass fabrication of resistive random access crossbar arrays by step and flash imprint lithography. | |
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MedLine Citation:
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PMID: 19809105 Owner: NLM Status: PubMed-not-MEDLINE |
Abstract/OtherAbstract:
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Step and flash imprint lithography (SFIL) is a promising method recently used for next generation lithographic technology because it is a high-speed process that can be carried out at room temperature and low pressures. Improvements made to SFIL enable the replication of crossbar patterns with a high resolution and the development of suitable materials and techniques to achieve high resolution capability. In this study, SFIL is used to fabricate high-density random access crossbar arrays based on a NiO resistive switching system. The bottom and top electrodes are transferred onto silicon wafers perpendicular to each electrode using the inductively coupled plasma reactive ion etching (ICP-RIE) technique. Direct metal etching without a wet-based process minimizes damage to the electrode surface. The I-V curves of individual active cells (70 x 70 nm(2)) for crossbar arrays reveal the unipolar resistive switching (RS) behaviour of the fabricated device. A high off/on resistance ratio (>10(4)) and reproducible resistance switching characteristics for each active cell were found in different fields and for different wafers. The experimental data indicate that high-density crossbar arrays can be well replicated and that the electrical performance of these arrays is reliable. |
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Authors:
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Dae Keun Yun; Ki-Don Kim; Sungho Kim; Ji-Hye Lee; Hyeong-Ho Park; Jun-Ho Jeong; Yang-Kyu Choi; Dae-Geun Choi |
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Publication Detail:
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Type: Journal Article; Research Support, Non-U.S. Gov't Date: 2009-10-07 |
Journal Detail:
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Title: Nanotechnology Volume: 20 ISSN: 1361-6528 ISO Abbreviation: Nanotechnology Publication Date: 2009 Nov |
Date Detail:
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Created Date: 2009-10-07 Completed Date: 2010-02-16 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101241272 Medline TA: Nanotechnology Country: England |
Other Details:
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Languages: eng Pagination: 445305 Citation Subset: - |
Affiliation:
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Nano-mechanical System Research Center, Korea Institute of Machinery and Materials, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Republic of Korea. |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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