| Level-set-based inverse lithography for photomask synthesis. | |
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MedLine Citation:
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PMID: 20052080 Owner: NLM Status: MEDLINE |
Abstract/OtherAbstract:
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Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of the problem together with the first-order temporal and second-order spatial accurate discretization scheme. Experimental results show the superiority of the proposed level set-based ILT over the mainstream gradient methods. |
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Authors:
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Yijiang Shen; Ngai Wong; Edmund Y Lam |
Publication Detail:
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Type: Journal Article; Research Support, Non-U.S. Gov't |
Journal Detail:
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Title: Optics express Volume: 17 ISSN: 1094-4087 ISO Abbreviation: Opt Express Publication Date: 2009 Dec |
Date Detail:
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Created Date: 2010-01-06 Completed Date: 2010-03-17 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101137103 Medline TA: Opt Express Country: United States |
Other Details:
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Languages: eng Pagination: 23690-701 Citation Subset: IM |
Affiliation:
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Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong. yjshen@eee.hku.hk |
Export Citation:
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| MeSH Terms | |
Descriptor/Qualifier:
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Computer Simulation Image Interpretation, Computer-Assisted / methods* Light Manufactured Materials / radiation effects* Models, Chemical* Photochemistry / methods* Photography / methods* |
From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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