Document Detail


Level-set-based inverse lithography for photomask synthesis.
MedLine Citation:
PMID:  20052080     Owner:  NLM     Status:  MEDLINE    
Abstract/OtherAbstract:
Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of the problem together with the first-order temporal and second-order spatial accurate discretization scheme. Experimental results show the superiority of the proposed level set-based ILT over the mainstream gradient methods.
Authors:
Yijiang Shen; Ngai Wong; Edmund Y Lam
Publication Detail:
Type:  Journal Article; Research Support, Non-U.S. Gov't    
Journal Detail:
Title:  Optics express     Volume:  17     ISSN:  1094-4087     ISO Abbreviation:  Opt Express     Publication Date:  2009 Dec 
Date Detail:
Created Date:  2010-01-06     Completed Date:  2010-03-17     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101137103     Medline TA:  Opt Express     Country:  United States    
Other Details:
Languages:  eng     Pagination:  23690-701     Citation Subset:  IM    
Affiliation:
Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong. yjshen@eee.hku.hk
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MeSH Terms
Descriptor/Qualifier:
Computer Simulation
Image Interpretation, Computer-Assisted / methods*
Light
Manufactured Materials / radiation effects*
Models, Chemical*
Photochemistry / methods*
Photography / methods*

From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine


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