Document Detail


Influence of deposition pressure on N-doped ZnO films by RF magnetron sputtering.
MedLine Citation:
PMID:  20355483     Owner:  NLM     Status:  PubMed-not-MEDLINE    
Abstract/OtherAbstract:
N-doped ZnO films were deposited on glass substrates by RF magnetron sputtering with different deposition pressures. The samples were characterized by X-ray diffraction (XRD), atomic force morphology (AFM), X-ray photoelectron spectroscopy (XPS), Hall measurements and optical spectrophotometer. The XRD patterns confirmed that the films are polycrystalline and the influence of deposition pressure on the structural properties. AFM microstructures also authenticated the change in the size and shape of the grains as a function of deposition pressure; the root mean square (RMS) roughness has reached a maximum (10.65 nm) at 1.5 x 10(-2) mbar. XPS spectra revealed the change in the chemical composition. The amount of adsorbed oxygen and nitrogen at oxide sites has reached the maximum at 9.0 x 10(-3) mbar, where the film showed p-type conductivity. The optical transmittance spectra have indicated that the absorption edge is shifted towards the shorter wavelength at higher deposition pressure. Correspondingly, the optical band gap is increased from 2.17 to 2.80 eV. The average visible transmittance in the wavelength ranging 500-800 nm has been increased from 49% to 82%.
Authors:
Jinzhong Wang; Elangovan Elamurugu; Nuno Franco; Eduardo Alves; Ana M Botelho do Rego; Gon?alo Gon?alves; Rodrigo Martins; Elvira Fortunato
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Publication Detail:
Type:  Journal Article; Research Support, Non-U.S. Gov't    
Journal Detail:
Title:  Journal of nanoscience and nanotechnology     Volume:  10     ISSN:  1533-4880     ISO Abbreviation:  J Nanosci Nanotechnol     Publication Date:  2010 Apr 
Date Detail:
Created Date:  2010-04-01     Completed Date:  2010-05-26     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101088195     Medline TA:  J Nanosci Nanotechnol     Country:  United States    
Other Details:
Languages:  eng     Pagination:  2674-8     Citation Subset:  -    
Affiliation:
Material Science Department, CENIMAT/13N and CEMOP/UNINOVA, FCT-UNL, Campus de Caparica, 2829-516 Caparica, Portugal.
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