| Hole arrays generated by nanoparticle lithography. | |
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MedLine Citation:
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PMID: 23035797 Owner: NLM Status: Publisher |
Abstract/OtherAbstract:
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Large area dense hole arrays with feature size ~ 10 nm were generated using self-assembled monolayers of nanoparticles as etch masks. To fabricate the hole arrays, monolayers of nanoparticles were irradiated by electron beam to turn surfactants into amorphous carbon, treated by acid to remove the nanoparticle cores, and then etched by CF4 to deepen the holes. Evaporated gold films preferentially diffuse into the holes to generate gold nanoparticle arrays. However no obvious diffusion into holes was observed for a sputtered iron platinum film. |
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Authors:
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Tianlong Wen; Ryan A Booth; Sara A Majetich |
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Publication Detail:
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Type: JOURNAL ARTICLE Date: 2012-10-4 |
Journal Detail:
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Title: Nano letters Volume: - ISSN: 1530-6992 ISO Abbreviation: Nano Lett. Publication Date: 2012 Oct |
Date Detail:
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Created Date: 2012-10-5 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101088070 Medline TA: Nano Lett Country: - |
Other Details:
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Languages: ENG Pagination: - Citation Subset: - |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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