Document Detail


Focused laser lithographic system with sub-wavelength resolution based on vortex laser induced opacity of photochromic material.
MedLine Citation:
PMID:  25490658     Owner:  NLM     Status:  In-Data-Review    
Abstract/OtherAbstract:
A focused laser lithographic system combines with vortex laser induced opacity of photochromic layer to write patterns with linewidth below wavelength. A photochromic layer is formed by coating the mixture of metanil yellow and aqueous PVA solution on the photoresist layer. In our system, the center of a lithographic laser with a 405 nm wavelength coincides with the center of vortex laser with a 532 nm wavelength. When a photochromic layer is illuminated by both lasers simultaneously, the absorbance for the lithographic laser decreases at the hollow region of the vortex laser but increases at its annular region, so that a transparent aperture for the lithographic laser is created and its size could be tuned by changing the power of vortex laser; therefore, the linewidth of written patterns is variable. Experimentally, using a 20× lens (NA = 0.4), this system condenses the linewidth of written patterns from 6614 to 350 nm.
Authors:
Zhen Wei; Jian Bai; Jianfeng Xu; Chen Wang; Yuan Yao; Neibin Hu; Yiyong Liang; Kaiwei Wang; Guoguang Yang
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Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Optics letters     Volume:  39     ISSN:  1539-4794     ISO Abbreviation:  Opt Lett     Publication Date:  2014 Dec 
Date Detail:
Created Date:  2014-12-10     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  7708433     Medline TA:  Opt Lett     Country:  United States    
Other Details:
Languages:  eng     Pagination:  6707-10     Citation Subset:  IM    
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