Document Detail

Fluorinated acid amplifiers for EUV lithography.
MedLine Citation:
PMID:  19569650     Owner:  NLM     Status:  MEDLINE    
Five new compounds were synthesized for use as acid amplifiers in EUV (13.5 nm) photoresists. Four compounds act as acid amplifiers and decompose by autocatalytic kinetics to generate fluorinated sulfonic acids, essential for the simultaneous improvement of resolution, sensitivity, and line edge roughness (LER) in EUV photoresists. The decomposition rates were studied using (19)F NMR in the presence and absence of 1.2 equiv of tri-tert-butylpyridine. Three acid amplifiers decomposed 490, 1360, and 1430 times faster without base than with base. Preliminary lithographic evaluations show that cis-1-methyl-2-(4-(trifluoromethyl)phenylsulfonyloxy)cyclohexyl acetate simultaneously improves the resolution, LER, and sensitivity of an EUV photoresist.
Seth Kruger; Sri Revuru; Craig Higgins; Sarah Gibbons; Daniel A Freedman; Wang Yueh; Todd R Younkin; Robert L Brainard
Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Journal of the American Chemical Society     Volume:  131     ISSN:  1520-5126     ISO Abbreviation:  J. Am. Chem. Soc.     Publication Date:  2009 Jul 
Date Detail:
Created Date:  2009-07-22     Completed Date:  2009-10-14     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  7503056     Medline TA:  J Am Chem Soc     Country:  United States    
Other Details:
Languages:  eng     Pagination:  9862-3     Citation Subset:  IM    
College of Nanoscale Science and Engineering, University at Albany, Albany, New York 12203, USA.
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MeSH Terms
Acids / chemistry*
Hydrocarbons, Fluorinated / chemistry*
Time Factors
Ultraviolet Rays
Reg. No./Substance:
0/Acids; 0/Hydrocarbons, Fluorinated

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