| Fluorinated acid amplifiers for EUV lithography. | |
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MedLine Citation:
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PMID: 19569650 Owner: NLM Status: MEDLINE |
Abstract/OtherAbstract:
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Five new compounds were synthesized for use as acid amplifiers in EUV (13.5 nm) photoresists. Four compounds act as acid amplifiers and decompose by autocatalytic kinetics to generate fluorinated sulfonic acids, essential for the simultaneous improvement of resolution, sensitivity, and line edge roughness (LER) in EUV photoresists. The decomposition rates were studied using (19)F NMR in the presence and absence of 1.2 equiv of tri-tert-butylpyridine. Three acid amplifiers decomposed 490, 1360, and 1430 times faster without base than with base. Preliminary lithographic evaluations show that cis-1-methyl-2-(4-(trifluoromethyl)phenylsulfonyloxy)cyclohexyl acetate simultaneously improves the resolution, LER, and sensitivity of an EUV photoresist. |
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Authors:
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Seth Kruger; Sri Revuru; Craig Higgins; Sarah Gibbons; Daniel A Freedman; Wang Yueh; Todd R Younkin; Robert L Brainard |
Publication Detail:
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Type: Journal Article |
Journal Detail:
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Title: Journal of the American Chemical Society Volume: 131 ISSN: 1520-5126 ISO Abbreviation: J. Am. Chem. Soc. Publication Date: 2009 Jul |
Date Detail:
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Created Date: 2009-07-22 Completed Date: 2009-10-14 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 7503056 Medline TA: J Am Chem Soc Country: United States |
Other Details:
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Languages: eng Pagination: 9862-3 Citation Subset: IM |
Affiliation:
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College of Nanoscale Science and Engineering, University at Albany, Albany, New York 12203, USA. |
Export Citation:
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APA/MLA Format Download EndNote Download BibTex |
| MeSH Terms | |
Descriptor/Qualifier:
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Acids
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chemistry* Catalysis Hydrocarbons, Fluorinated / chemistry* Time Factors Ultraviolet Rays |
| Chemical | |
Reg. No./Substance:
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0/Acids; 0/Hydrocarbons, Fluorinated |
From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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