Document Detail

Facile Synthesis of Few-Layer Graphene with a Controllable Thickness Using Rapid Thermal Annealing.
MedLine Citation:
PMID:  22397526     Owner:  NLM     Status:  Publisher    
Few-layer graphene films with a controllable thickness were grown on a nickel surface by rapid thermal annealing (RTA) in vacuum. The instability of nickel films in air facilitates the spontaneous formation of ultrathin (< 2-3 nm) carbon- and oxygen-containing compounds on a nickel surface there by the high-temperature annealing of the nickel samples without the introduction of intentional carbon-containing precursors results in the formation of graphene films. From annealing temperature and ambient studies during RTA, it was found that the evaporation of oxygen atoms from the surface is the dominant factor affecting the formation of graphene films. The thickness of the graphene layers is strongly dependent on the RTA temperature and time and the resulting films have a limited thickness less than 2 nm even for an extended RTA time. The transferred films have a low sheet resistance of ~0.9±0.4 kΩ/sq, with ~94±2 percent optical transparency, making them useful for applications as flexible transparent conductors.
Jae Hwan Chu; Jinsung Kwak; Tae-Yang Kwon; Soon-Dong Park; Heungseok Go; Sung Youb Kim; Kibog Park; Seoktae Kang; Soon-Yong Kwon
Related Documents :
21029506 - Reduction in sugar-sweetened beverages is not associated with more water or diet drinks.
21137786 - Introduction of gold nanoparticles into myoglobin-nafion film for direct electrochemist...
17451766 - Cyanobacteria and their toxins in treated-water storage reservoirs in abha city, saudi ...
23417996 - Supramolecular ladders from dimeric cucurbit[6]uril.
4615636 - Purification of clostridium botuliunum type f progenitor toxin.
15713116 - Spontaneous immobilization of liposomes on electron-beam exposed resist surfaces.
Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2012-3-7
Journal Detail:
Title:  ACS applied materials & interfaces     Volume:  -     ISSN:  1944-8252     ISO Abbreviation:  -     Publication Date:  2012 Mar 
Date Detail:
Created Date:  2012-3-8     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  101504991     Medline TA:  ACS Appl Mater Interfaces     Country:  -    
Other Details:
Languages:  ENG     Pagination:  -     Citation Subset:  -    
Export Citation:
APA/MLA Format     Download EndNote     Download BibTex
MeSH Terms

From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine

Previous Document:  Reliability of the Strengths and Difficulties Questionnaire among Finnish 4-9-year-old children.
Next Document:  Severe Early Maternal Hypothyroidism Corrected Prior to the Third Trimester Associated with Normal C...