Document Detail

Fabrication of ultralow-loss Si/SiO(2) waveguides by roughness reduction.
MedLine Citation:
PMID:  18059727     Owner:  NLM     Status:  In-Data-Review    
We demonstrate 0.8-dB/cm transmission loss for a single-mode, strip Si/SiO(2) waveguide with submicrometer cross-sectional dimensions. We compare the conventional waveguide-fabrication method with two smoothing technologies that we have developed, oxidation smoothing and anisotropic etching. We observe significant reduction of sidewall roughness with our smoothing technologies, which directly results in reduced scattering losses. The rapid increase in the scattering losses as the waveguide dimension is miniaturized, as seen in conventionally fabricated waveguides, is effectively suppressed in the waveguides made with our smoothing technologies. In the oxidation smoothing case, the loss is reduced from 32 dB/cm for the conventional fabrication method to 0.8 dB/cm for the single-mode waveguide width of 0.5 microm . This is to our knowledge the smallest reported loss for a high-index-difference system such as a Si/SiO(2) strip waveguide.
K K Lee; D R Lim; L C Kimerling; J Shin; F Cerrina
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Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Optics letters     Volume:  26     ISSN:  0146-9592     ISO Abbreviation:  Opt Lett     Publication Date:  2001 Dec 
Date Detail:
Created Date:  2007-12-06     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  7708433     Medline TA:  Opt Lett     Country:  United States    
Other Details:
Languages:  eng     Pagination:  1888-90     Citation Subset:  -    
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