Document Detail


Eliminating the birefringence in silicon-on-insulator ridge waveguides by use of cladding stress.
MedLine Citation:
PMID:  15532275     Owner:  NLM     Status:  PubMed-not-MEDLINE    
Abstract/OtherAbstract:
We propose and demonstrate the use of the cladding stress-induced photoelastic effect to eliminate modal birefringence in silicon-on-insulator (SOI) ridge waveguides. Birefringence-free operation was achieved for waveguides with otherwise large birefringence by use of properly chosen thickness and stress of the upper cladding layer. With the stress levels typically found in cladding materials such as SiO2, the birefringence modification range can be as large as 10(-3). In arrayed waveguide grating demultiplexers that were fabricated in a SOI platform, we demonstrated the reduction of the birefringence from 1.2 x 10(-3) (without the upper cladding) to 4.5 x 10(-5) when a 0.8-microm oxide upper cladding with a stress of -320 MPa (compressive) was used. Because the index changes induced by the stress are orders of magnitude smaller than the waveguide core-cladding index contrast, the associated mode mismatch loss is negligible.
Authors:
D X Xu; P Cheben; D Dalacu; A Delâge; S Janz; B Lamontagne; M J Picard; W N Ye
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Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Optics letters     Volume:  29     ISSN:  0146-9592     ISO Abbreviation:  Opt Lett     Publication Date:  2004 Oct 
Date Detail:
Created Date:  2004-11-09     Completed Date:  2004-12-21     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  7708433     Medline TA:  Opt Lett     Country:  United States    
Other Details:
Languages:  eng     Pagination:  2384-6     Citation Subset:  -    
Affiliation:
Institute for Microstructural Sciences, National Research Council of Canada, Ottawa, Ontario, Canada. danxia.xu@nrc-cnrc.gc.ca
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