Document Detail


Electrochemical preparation of pore wall modification gradients across thin porous silicon layers.
MedLine Citation:
PMID:  20218688     Owner:  NLM     Status:  PubMed-not-MEDLINE    
Abstract/OtherAbstract:
Thin film porous silicon layers have been constructed in which the level of chemical modification to the pore walls is altered in a controlled gradient across the material. The gradient modification within such a nanoporous material represents a significant advance over gradients imposed across a flat surface. Gradients of methyl, pentyl acetate, and decyl groups are formed via electrochemical attachment of organohalides with an asymmetric electrode arrangement. The stability and hydrophobicity of the latter two systems have been improved through postprocess "end-capping" of the porous silicon with methyl groups. Two-dimensional mapping transmission FTIR microspectrophotometry and ATR-FTIR have been employed to characterize these new materials. Cleaving the surface-attached pentyl acetate groups to 5-hydroxypentyl groups leads to materials that can act as efficient visual indicators of the ethanol concentration in water over the range 1-10 vol %.
Authors:
Corrina M Thompson; Michel Nieuwoudt; Anne M Ruminski; Michael J Sailor; Gordon M Miskelly
Related Documents :
12520438 - Analytical characterization of thin carbon films.
16912808 - Characterization of high refractive index semiconductor films by surface plasmon resona...
20358948 - Preparation of born-doped a-sic:h thin films by icp-cvd method and to the application o...
20969068 - Resonant ultrasound spectroscopy for small or arbitrarily shaped samples and thin films.
18674858 - The ph as a key parameter in the choice between coagulation and electrocoagulation for ...
18307358 - Conjugating a cyanine dye to a polymer surface. in search of a monomeric dye in apolar ...
Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Langmuir : the ACS journal of surfaces and colloids     Volume:  26     ISSN:  1520-5827     ISO Abbreviation:  Langmuir     Publication Date:  2010 May 
Date Detail:
Created Date:  2010-05-12     Completed Date:  2010-08-17     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  9882736     Medline TA:  Langmuir     Country:  United States    
Other Details:
Languages:  eng     Pagination:  7598-603     Citation Subset:  -    
Affiliation:
Department of Chemistry, University of Auckland, Private Bag 92019, Auckland 1142, New Zealand.
Export Citation:
APA/MLA Format     Download EndNote     Download BibTex
MeSH Terms
Descriptor/Qualifier:

From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine


Previous Document:  Molecular Simulation Study of Anisotropic Wetting.
Next Document:  Heterobimetallic Transition Metal/Rare Earth Metal Bifunctional Catalysis: A Cu/Sm/Schiff Base Compl...