| Dual patterning and sequential functionalization of block copolymers using photocrosslinkable random copolymer film. | |
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MedLine Citation:
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PMID: 19546495 Owner: NLM Status: MEDLINE |
Abstract/OtherAbstract:
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A novel method of dual patterning and sequential functionalization of block copolymers is proposed using a photocrosslinkable random copolymer film, poly(styrene-r-(tert-butyl acrylate)-r-(cinnamoyloxyethyl acrylate)). The tert-butyl esters of the block copolymer, polystyrene-block-poly(tert-butyl acrylate), coated on the patterned random copolymer film were sequentially deprotected to give carboxylic acids using an acid catalyst and heat treatment. The sequentially produced carboxylic acid patterns were used for the sequential patterning of gold nanoparticles as an example of potential applications. |
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Authors:
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Se Jin Ku; Su Min Kim; Jin-Baek Kim |
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Publication Detail:
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Type: Journal Article; Research Support, Non-U.S. Gov't Date: 2009-06-23 |
Journal Detail:
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Title: Nanotechnology Volume: 20 ISSN: 1361-6528 ISO Abbreviation: Nanotechnology Publication Date: 2009 Jul |
Date Detail:
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Created Date: 2009-06-24 Completed Date: 2009-08-25 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101241272 Medline TA: Nanotechnology Country: England |
Other Details:
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Languages: eng Pagination: 285304 Citation Subset: IM |
Affiliation:
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Department of Chemistry and School of Molecular Science (BK21), Korea Advanced Institute of Science and Technology (KAIST), Yuseong-Gu, Daejeon, Republic of Korea. |
Export Citation:
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| MeSH Terms | |
Descriptor/Qualifier:
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Acrylates
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chemistry* Nanoparticles / chemistry* Photochemistry / methods* Polymers / chemical synthesis*, chemistry* Polystyrenes / chemistry* |
| Chemical | |
Reg. No./Substance:
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0/Acrylates; 0/Polymers; 0/Polystyrenes; 0/poly(styrene-b-tert-butylacrylate); 0/tert-butyl acrylate |
From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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