Document Detail


Dual Photosensitive Polymers with Wavelength-Selective Photoresponse.
MedLine Citation:
PMID:  24831417     Owner:  NLM     Status:  Publisher    
Abstract/OtherAbstract:
Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with "positive" and "negative" tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns.
Authors:
Luis García-Fernández; Cyril Herbivo; Verónica San Miguel Arranz; David Warther; Loïc Donato; Alexandre Specht; Aránzazu Del Campo
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Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2014-5-15
Journal Detail:
Title:  Advanced materials (Deerfield Beach, Fla.)     Volume:  -     ISSN:  1521-4095     ISO Abbreviation:  Adv. Mater. Weinheim     Publication Date:  2014 May 
Date Detail:
Created Date:  2014-5-16     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  9885358     Medline TA:  Adv Mater     Country:  -    
Other Details:
Languages:  ENG     Pagination:  -     Citation Subset:  -    
Copyright Information:
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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