| Depth-dependent anti-reflection and enhancement of luminescence from Si quantum dots-based multilayer on nano-patterned Si substrates. | |
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MedLine Citation:
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PMID: 21369157 Owner: NLM Status: In-Data-Review |
Abstract/OtherAbstract:
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Nano-sphere lithography technique was used to fabricate nano-patterned Si substrates with various depths by controlling the etching time. The depth-dependent broadband anti-reflection was observed and the reflectivity could be reduced to 5%. By depositing Si quantum dots/SiO<sub>2</sub> multilayer on nano-patterned substrate, the reflection was further suppressed and luminescence intensity was significantly enhanced. The luminescence enhancement is dependent of the etching depth and the luminescence can be one order of magnitude stronger than that on flat substrate due to both the improved absorption of excitation light and the increase of light extraction ratio by nano-patterned structures. |
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Authors:
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Yu Liu; Jun Xu; Hongcheng Sun; Shenghua Sun; Wei Xu; Ling Xu; Kunji Chen |
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Publication Detail:
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Type: Journal Article |
Journal Detail:
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Title: Optics express Volume: 19 ISSN: 1094-4087 ISO Abbreviation: Opt Express Publication Date: 2011 Feb |
Date Detail:
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Created Date: 2011-03-03 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101137103 Medline TA: Opt Express Country: United States |
Other Details:
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Languages: eng Pagination: 3347-52 Citation Subset: IM |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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