Document Detail

Crystallographic orientation contrast associated with Ga+ ion channelling for Fe and Cu in focused ion beam method.
MedLine Citation:
PMID:  15582968     Owner:  NLM     Status:  MEDLINE    
In this study, Cu and Fe single crystals are used to examine the change in secondary electron intensity associated with Ga(+) ion channelling in a focused ion beam (FIB) system. The single crystals having three different orientations are tilted with respect to the beam incidence and the resulting variation in the secondary electron intensity is measured through the variation in brightness of the crystals. It is shown that intensity minima appear at the beam directions normal to the lower indices of the crystal orientations. The appearance of the intensity minima including the magnitude of the minima is consistent with the prediction based on the event of ion channelling in the crystal and is affected by the crystal structure. The effect of background on the intensity minima is discussed in this study. It is suggested that the presence of the intensity minima may be used to identify a crystal orientation including a crystal structure.
Y Yahiro; K Kaneko; T Fujita; W-J Moon; Z Horita
Related Documents :
23941238 - Bonding with parallel spins: high-spin clusters of monovalent metal atoms.
19881618 - Femtosecond laser writing of er3+-doped caf2 crystalline patterns in glass.
20221028 - Measurement of very high resistivities using electrooptic crystals.
20861998 - Absorption measurements of mixed silver halide crystals and fibers by laser calorimetry.
18963688 - The stability of metal complexes with 8-mercaptoquinoline and alkyl-substituted 8-merca...
17625858 - [1]molybdarenophanes: strained metallarenophanes with aluminum, gallium, and silicon in...
Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Journal of electron microscopy     Volume:  53     ISSN:  0022-0744     ISO Abbreviation:  J Electron Microsc (Tokyo)     Publication Date:  2004  
Date Detail:
Created Date:  2004-12-07     Completed Date:  2005-03-04     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  7611157     Medline TA:  J Electron Microsc (Tokyo)     Country:  Japan    
Other Details:
Languages:  eng     Pagination:  571-6     Citation Subset:  IM    
Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University, Higashi-ku, Fukuoka 812-8581, Japan.
Export Citation:
APA/MLA Format     Download EndNote     Download BibTex
MeSH Terms
Copper / chemistry*
Iron / chemistry*
Microscopy, Electron, Scanning
Reg. No./Substance:
7439-89-6/Iron; 7440-50-8/Copper; 7440-55-3/Gallium

From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine

Previous Document:  Microsampling technique for EBSP inspection on the cross-sections of copper trench lines in ULSIs.
Next Document:  Direct observation of electrostatic microfields by four-electron-wave interference using two electro...