Document Detail


Continuous self-imaging regime with a double-grating mask.
MedLine Citation:
PMID:  19844307     Owner:  NLM     Status:  MEDLINE    
Abstract/OtherAbstract:
We analyze the Talbot effect produced by a mask composed of two diffraction gratings. Combinations with phase and amplitude gratings have been studied in the near-field regime. For a two-phase-gratings configuration, the Talbot effect is canceled, even when using monochromatic light; that is, the intensity distribution is nearly independent of the distance from the mask to the observation plane. Therefore, the mechanical tolerances of devices that use the Talbot effect may be improved. In addition, the spatial frequency of the fringes is quadrupled, which improves the accuracy of devices that employ this mask. An experimental verification for the best case two phase gratings, has also been performed, validating the theoretical results.
Authors:
Luis Miguel Sanchez-Brea; Francisco Jose Torcal-Milla; Eusebio Bernabeu
Related Documents :
11899997 - Compact beam expander with linear gratings.
10960647 - Inter-attribute tilt effects and orientation analysis in the visual brain.
9274777 - Implicit masking constrained by spatial inhomogeneities.
18079947 - High-resolution spectrometry for diffuse light by use of anamorphic concentration.
1754307 - Ventilatory sensitivities of peripheral and central chemoreceptors of young piglets to ...
18279907 - Deciding what to see: the role of intention and attention in the perception of apparent...
Publication Detail:
Type:  Journal Article; Research Support, Non-U.S. Gov't    
Journal Detail:
Title:  Applied optics     Volume:  48     ISSN:  1539-4522     ISO Abbreviation:  Appl Opt     Publication Date:  2009 Oct 
Date Detail:
Created Date:  2009-10-21     Completed Date:  2010-01-05     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  0247660     Medline TA:  Appl Opt     Country:  United States    
Other Details:
Languages:  eng     Pagination:  5722-7     Citation Subset:  IM    
Affiliation:
Optics Department, Applied Optics Complutense Group, Universidad Complutense de Madrid, Facultad de Ciencias F??sicas, Ciudad Universitaria s.n., 28040 Madrid, Spain. sanchezbrea@fis.ucm.es
Export Citation:
APA/MLA Format     Download EndNote     Download BibTex
MeSH Terms
Descriptor/Qualifier:
Contrast Sensitivity
Equipment Design
Image Interpretation, Computer-Assisted / methods*
Image Processing, Computer-Assisted
Light
Optics and Photonics*
Pattern Recognition, Visual
Refractometry / methods*

From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine


Previous Document:  Optical near-field study of photonic crystal tapers.
Next Document:  Effects of residue and antioxidant on thermo-optical properties of biodiesel.