| Color variation in periodic Ag line arrays patterned by using electron-beam lithography. | |
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MedLine Citation:
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PMID: 21128460 Owner: NLM Status: PubMed-not-MEDLINE |
Abstract/OtherAbstract:
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Periodic Ag line arrays with different line pitches from 500 nm to 950 nm on ITO coated glass substrates have been fabricated by using electron-beam lithography (EBL) technique for studying the color light guide in a display system. The patterned Ag line array is used as a light outcoupling and color-selection component due to the emission wavelength changed by the Ag line arrays with different periodic distances that could achieve color variation. We have demonstrated that the ITO coated glass substrates containing periodic Ag line arrays with varied line pitches can be used as a color filter in a display device. This means that with a proper metallic nanostructure layer, the red, green, and blue colors in a display system can be obtained without a traditional color filter for modern multi-applications of optoelectronic display devices. |
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Authors:
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D H Wei; K W Cheng; Y D Yao; S Y Hsu; P K Wei; J H Huang |
Publication Detail:
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Type: Journal Article |
Journal Detail:
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Title: Journal of nanoscience and nanotechnology Volume: 10 ISSN: 1533-4880 ISO Abbreviation: J Nanosci Nanotechnol Publication Date: 2010 Jul |
Date Detail:
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Created Date: 2010-12-06 Completed Date: 2010-12-23 Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 101088195 Medline TA: J Nanosci Nanotechnol Country: United States |
Other Details:
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Languages: eng Pagination: 4581-5 Citation Subset: - |
Affiliation:
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Department of Mechanical Engineering, National Taipei University of Technology, Taipei 106, Taiwan. |
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Descriptor/Qualifier:
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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