| Chemical analysis of acidic silicon etch solutions I. Titrimetric determination of HNO(3), HF, and H(2)SiF(6). | |
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MedLine Citation:
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PMID: 19073019 Owner: NLM Status: Publisher |
Abstract/OtherAbstract:
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The chemical etching of silicon using HF-HNO(3) mixtures is a widely used process in the processing of silicon wafers for microelectronic or photovoltaic applications. The control of the etch bath composition is the necessary condition for an effective bath utilization, for the replenishment of the consumed acids, and to maintain a certain etch rate. The present paper describes two methods for the total analysis of the individual etch bath constituents HF, HNO(3), and H(2)SiF(6). Both methods start with an aqueous acid-base titration determining the total acid concentration and the concentration of H(2)SiF(6). The first method is an acid-base titration using a 0.1molL(-1) methanolic solution of cyclohexylamine (CHA) as non-aqueous titrant to determine the content of nitric acid. Then, the amount of hydrofluoric acid is calculated from the difference between the total acid and nitric acid content. The second method is based on the determination of the total fluoride concentration using a fluoride ion-selective electrode (F-ISE). The content of hydrofluoric acid is obtained from the difference between the total fluoride content and the amount of fluoride bound as H(2)SiF(6). The amount of nitric acid results finally calculated as difference to the total acid content. |
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Authors:
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Antje Henßge; Jörg Acker |
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Publication Detail:
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Type: JOURNAL ARTICLE Date: 2007-2-15 |
Journal Detail:
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Title: Talanta Volume: 73 ISSN: 1873-3573 ISO Abbreviation: Talanta Publication Date: 2007 Sep |
Date Detail:
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Created Date: 2008-12-16 Completed Date: - Revised Date: - |
Medline Journal Info:
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Nlm Unique ID: 2984816R Medline TA: Talanta Country: - |
Other Details:
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Languages: ENG Pagination: 220-226 Citation Subset: - |
Affiliation:
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Department of Chemical Engineering, Hochschule für Technik und Wirtschaft Dresden-University of Applied Science, Friedrich-List-Platz 1, Dresden 01069, Germany; Leibniz-Institute for Solid State and Materials Research Dresden (IFW Dresden), P.O. Box 270016, D-01171 Dresden, Germany. |
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From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
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