Document Detail

Atomic Layer Engineering of Perovskite Oxides for Chemically Sharp Heterointerfaces.
MedLine Citation:
PMID:  23034879     Owner:  NLM     Status:  Publisher    
Atomic layer engineering enables fabrication of a chemically sharp oxide heterointerface. The interface formation and strain evolution during the initial growth of LaAlO(3) /SrTiO(3) heterostructures by pulsed laser deposition are investigated in search of a means for controlling the atomic-sharpness of the interface. This study shows that inserting a monolayer of LaAlO(3) grown at high oxygen pressure dramatically enhances interface abruptness.
Woo Seok Choi; Christopher M Rouleau; Sung Seok A Seo; Zhenlin Luo; Hua Zhou; Timothy T Fister; Jeffrey A Eastman; Paul H Fuoss; Dillon D Fong; Jonathan Z Tischler; Gyula Eres; Matthew F Chisholm; Ho Nyung Lee
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Publication Detail:
Type:  JOURNAL ARTICLE     Date:  2012-10-4
Journal Detail:
Title:  Advanced materials (Deerfield Beach, Fla.)     Volume:  -     ISSN:  1521-4095     ISO Abbreviation:  Adv. Mater. Weinheim     Publication Date:  2012 Oct 
Date Detail:
Created Date:  2012-10-4     Completed Date:  -     Revised Date:  -    
Medline Journal Info:
Nlm Unique ID:  9885358     Medline TA:  Adv Mater     Country:  -    
Other Details:
Languages:  ENG     Pagination:  -     Citation Subset:  -    
Copyright Information:
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
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