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Anomalous scaling of the surface width during Cu electrodeposition.
MedLine Citation:
PMID:  11177805     Owner:  NLM     Status:  PubMed-not-MEDLINE    
Abstract/OtherAbstract:
Kinetic roughening during thin film growth is a widely studied phenomenon, with many systems found to follow simple scaling laws. We show that for Cu electrodeposition from additive-free acid sulphate electrolyte, an extra scaling exponent is required to characterize the time evolution of the local roughness. The surface width w(l,t) scales as t(beta(loc))lH, when the deposition time t is large or the size l of the region over which w is measured is small, and as t(beta+beta(loc)) when l is large or t is small. This is the first report of such anomalous scaling for an experimental ( 2+1)-dimensional system. When the deposition current density or Cu concentration is varied, only beta(loc) changes, while the other power law exponents H and beta remain constant.
Authors:
S Huo; W Schwarzacher
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Publication Detail:
Type:  Journal Article    
Journal Detail:
Title:  Physical review letters     Volume:  86     ISSN:  0031-9007     ISO Abbreviation:  Phys. Rev. Lett.     Publication Date:  2001 Jan 
Date Detail:
Created Date:  2001-02-22     Completed Date:  2001-04-19     Revised Date:  2003-10-31    
Medline Journal Info:
Nlm Unique ID:  0401141     Medline TA:  Phys Rev Lett     Country:  United States    
Other Details:
Languages:  eng     Pagination:  256-9     Citation Subset:  -    
Affiliation:
H. H. Wills Physics Laboratory, Tyndall Avenue, Bristol BS8 1TL, United Kingdom.
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