| Advanced mask aligner lithography: new illumination system. | |
| | |
MedLine Citation:
|
PMID: 20940992 Owner: NLM Status: PubMed-not-MEDLINE |
Abstract/OtherAbstract:
|
A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatial filtering allows to freely shape the angular spectrum to minimize diffraction effects in contact and proximity lithography. Telecentric illumination and ability to precisely control the illumination light allows to introduce resolution enhancement technologies (RET) like customized illumination, optical proximity correction (OPC) and source-mask optimization (SMO) in mask aligner lithography. |
| | |
Authors:
|
Reinhard Voelkel; Uwe Vogler; Andreas Bich; Pascal Pernet; Kenneth J Weible; Michael Hornung; Ralph Zoberbier; Elmar Cullmann; Lorenz Stuerzebecher; Torsten Harzendorf; Uwe D Zeitner |
Publication Detail:
|
Type: Journal Article; Research Support, Non-U.S. Gov't |
Journal Detail:
|
Title: Optics express Volume: 18 ISSN: 1094-4087 ISO Abbreviation: Opt Express Publication Date: 2010 Sep |
Date Detail:
|
Created Date: 2010-10-13 Completed Date: 2011-02-02 Revised Date: - |
Medline Journal Info:
|
Nlm Unique ID: 101137103 Medline TA: Opt Express Country: United States |
Other Details:
|
Languages: eng Pagination: 20968-78 Citation Subset: - |
Affiliation:
|
SUSS MicroOptics SA, Jaquet-Droz 7, 2000 Neuchâtel, Switzerland. voelkel@suss.ch |
Export Citation:
|
APA/MLA Format Download EndNote Download BibTex |
| MeSH Terms | |
Descriptor/Qualifier:
|
|
From MEDLINE®/PubMed®, a database of the U.S. National Library of Medicine
Previous Document: Directional control of infrared antenna-coupled tunnel diodes.
Next Document: Power calculation of wavelength tunable Yb3+:LSO laser.